Microporosity and adhesion of ion bombarded thin silicon surface films
- 1 May 1988
- journal article
- Published by Elsevier in Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
- Vol. 32 (1-4) , 104-110
- https://doi.org/10.1016/0168-583x(88)90190-5
Abstract
No abstract availableKeywords
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- Measurement of adhesion of thin evaporated films on glass substrates by means of the direct pull methodThin Solid Films, 1973