Ultraviolet lasing with low excitation intensity in deep-level emission free ZnO films
- 1 September 2005
- journal article
- Published by Elsevier in Journal of Crystal Growth
- Vol. 282 (3-4) , 359-364
- https://doi.org/10.1016/j.jcrysgro.2005.05.019
Abstract
No abstract availableKeywords
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