The decomposition of trumethylgallium, triethylgallium and trimethylaluminum on Si(100)
- 10 January 1990
- Vol. 41 (4-6) , 951-954
- https://doi.org/10.1016/0042-207x(90)93831-3
Abstract
No abstract availableKeywords
This publication has 10 references indexed in Scilit:
- Trimethylgallium Decomposition on Si(100)Journal of the Electrochemical Society, 1989
- Decomposition of trimethylaluminum on silicon(100)Chemistry of Materials, 1989
- The decomposition of triethylgallium on Si(100)Journal of Vacuum Science & Technology B, 1989
- Decomposition of trimethylgallium on Si(100): Spectroscopic identification of the intermediatesSurface Science, 1989
- Understanding of surface chemistry of III–V metalorganic chemical vapor deposition reactantsJournal of Vacuum Science & Technology A, 1989
- In situ mass spectroscopy and thermogravimetric studies of GaAs MOCVD gas phase and surface reactionsJournal of Crystal Growth, 1987
- Multiphoton-ionization / mass spectrometric detection of gallium atom during the trimethylgallium CVD reactionChemical Physics Letters, 1986
- In situ, real-time diagnostics of OMVPE using IR-diode laser spectroscopyJournal of Crystal Growth, 1986
- Mass Spectrometric Study of Ga ( CH 3 ) 3 and Ga ( C 2 H 5 ) 3 Decomposition Reaction in H 2 and N 2Journal of the Electrochemical Society, 1985
- Infrared matrix isolation spectroscopy of trimethylgallium, trimethylaluminium and triethylaluminiumSpectrochimica Acta Part A: Molecular Spectroscopy, 1984