Low weight spreading resistance profiling of ultrashallow dopant profiles
- 1 January 1998
- journal article
- Published by American Vacuum Society in Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
- Vol. 16 (1) , 401-405
- https://doi.org/10.1116/1.589817
Abstract
No abstract availableKeywords
This publication has 12 references indexed in Scilit:
- Recent insights into the physical modeling of the spreading resistance point contactJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1996
- Sheet resistance corrections for spreading resistance ultrashallow profilingJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1996
- Automatic generation of shallow electrically active dopant profiles from spreading resistance measurementsJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1994
- Spreading resistance analysis based on the method of regularisationSolid-State Electronics, 1993
- A Poisson solver for spreading resistance analysisJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1992
- Dopant profile extraction from spreading resistance measurementsJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1992
- Poisson-based analysis of spreading resistance profilesJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1992
- Optimization of the spreading resistance profiling technique for submicron structuresSolid-State Electronics, 1990
- Laser Interferometer Bevel Angle Measurement for Spreading Resistance ProfilingJournal of the Electrochemical Society, 1980
- Application of Multilayer Potential Distribution to Spreading Resistance Correction FactorsJournal of the Electrochemical Society, 1969