Low defect density a-Si, Ge:H alloy films produced by magnetron sputtering from separate Si and Ge cathodes

This publication has 10 references indexed in Scilit:

• Thin films of a-Si1−xGex:H alloys by dual magnetron sputtering in a UHV chamber
  Journal of Vacuum Science & Technology A, 1985
• Structural, electrical, and optical properties of a-${\mathrm{Si}}_{1\mathrm{-}\mathrm{x}}$${\mathrm{Ge}}_{\mathrm{x}}$:H and an inferred electronic band structure
  Physical Review B, 1985
• Chemical bonding of hydrogen and oxygen in glow-discharge–deposited thin films ofa-Ge:H anda-Ge:(H,O)
  Physical Review B, 1985
• High photoconductivity in dual magnetron sputtered amorphous hydrogenated silicon and germanium alloy films
  Applied Physics Letters, 1984
• Planar magnetron sputtering of a-Si:H and a-Ge:H thin films
  Journal of Vacuum Science & Technology A, 1984
• Reactively sputtered a-SixGe1−x:H alloys with compositional gradient in plane of film
  Applied Physics Letters, 1984
• Preparation of photoconductive a-SiGe alloy by glow discharge
  Journal of Non-Crystalline Solids, 1983
• High photoconductivity in magnetron sputtered amorphous hydrogenated germanium films
  Applied Physics Letters, 1983
• Preferential Attachment of H in Amorphous Hydrogenated Binary Semiconductors and Consequent Inferior Reduction of Pseudogap State Density
  Physical Review Letters, 1981
• Dark conductivity and photoconductivity of hydrogenated amorphous Si1−xGex alloys
  Journal of Applied Physics, 1981