Characterization of the intrinsic double acceptor in undoped p-type gallium arsenide
- 15 September 1987
- journal article
- conference paper
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 62 (6) , 2320-2328
- https://doi.org/10.1063/1.339492
Abstract
A detailed study of the dominant double acceptor found in p‐type, undoped GaAs grown by the liquid‐encapsulated Czochralski technique has been performed using temperature‐dependent Hall effect, infrared absorption, spectral photoconductivity, and photoluminescence. Improved fitting techniques are presented for analyzing the temperature‐dependent Hall‐effect data. A dependence of the activation energy of the neutral state of the double acceptor as determined by Hall effect on the concentration of the defect has been observed and is discussed in terms of prevalent theories. The ionization energy of this level as determined by all three optical techniques is constant and independent of any concentration. Additional data on the correlation between the concentration of the double acceptor and the boron concentration in the material is presented. A model for this correlation is presented that is consistent with the isolated gallium antisite model for the double acceptor. Aluminum and indium alloyed samples were studied and no additional acceptors that could be attributed to these isovalent dopants were discovered.This publication has 26 references indexed in Scilit:
- Carrier concentration and activation energy in heavily donor-doped siliconJournal of Applied Physics, 1987
- Evidence for Creation of Gallium Antisite Defect in Surface Region of Bleat-Treated GaAsJapanese Journal of Applied Physics, 1986
- Photoluminescence of the 78 meV Acceptor in GaAs Layers Grown by Molecular Bearn EpitaxyJapanese Journal of Applied Physics, 1986
- Electronic Raman scattering of the negative charge state of the 78-meV double acceptor in GaAsPhysical Review B, 1986
- The Role of Gallium Antisite Defect in Activation and Type-Conversion in Si Implanted GaAsJapanese Journal of Applied Physics, 1985
- Infrared absorption studies of the boron B(2) center in GaAsSolid State Communications, 1985
- Statistics of multicharge centers in semiconductors: ApplicationsPhysical Review B, 1981
- On the Concentration Dependence of the Thermal Impurity‐to‐Band Activation Energies in SemiconductorsPhysica Status Solidi (b), 1981
- Variation of impurity−to−band activation energies with impurity densityJournal of Applied Physics, 1975
- Electrical Properties of Pure Silicon and Silicon Alloys Containing Boron and PhosphorusPhysical Review B, 1949