Secondary ion mass spectrometry using cluster primary ion beams
- 1 January 2003
- journal article
- Published by Elsevier in Applied Surface Science
- Vol. 203-204, 209-213
- https://doi.org/10.1016/s0169-4332(02)00627-x
Abstract
No abstract availableThis publication has 9 references indexed in Scilit:
- Negative cesium sputter ion source for generating cluster primary ion beams for secondary ion mass spectrometry analysisJournal of Vacuum Science & Technology A, 2001
- Surface Analysis Studies of Yield Enhancements in Secondary Ion Mass Spectrometry by Polyatomic ProjectilesThe Journal of Physical Chemistry B, 2001
- Use of an SF5+ polyatomic primary ion beam for ultrashallow depth profiling on an ion microscope secondary ion mass spectroscopy instrumentJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 2000
- Development of a triplasmatron ion source for the generation of SF5+ and F− primary ion beams on an ion microscope secondary ion mass spectrometry instrumentJournal of Vacuum Science & Technology A, 1999
- Preliminary evaluation of an SF5+ polyatomic primary ion beam for analysis of organic thin films by secondary ion mass spectrometryRapid Communications in Mass Spectrometry, 1998
- Giant Metal Sputtering Yields Induced by 20–5000 keV/atom Gold ClustersPhysical Review Letters, 1998
- Molecular ion imaging and dynamic secondary-ion mass spectrometry of organic compoundsAnalytical Chemistry, 1990
- Comparison of polyatomic and atomic primary beams for secondary ion mass spectrometry of organicsAnalytical Chemistry, 1989
- A versatile high intensity negative ion sourceNuclear Instruments and Methods in Physics Research, 1983