Structure and optical properties of hydrogenated amorphous carbon-tin alloys prepared using the sputter-assisted plasma chemical deposition technique
- 1 July 1987
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 150 (2) , 189-199
- https://doi.org/10.1016/0040-6090(87)90090-3
Abstract
No abstract availableKeywords
This publication has 13 references indexed in Scilit:
- Semiconductor properties of amorphous C-Sn thin filmsThin Solid Films, 1987
- Evidence for graphitic-type bonding in glow discharge hydrogenated amorphous silicon carbon alloysJournal of Applied Physics, 1985
- Determination of optical properties of SnO2 filmsIl Nuovo Cimento D, 1984
- Analysis of films prepared by plasma polymerization of acetylene in a D.C. magnetronThin Solid Films, 1983
- Hard carbon coatings with low optical absorptionApplied Physics Letters, 1983
- Preparation and properties of hard i-C and i-BN coatingsThin Solid Films, 1982
- Properties and structure of a-SiC:H for high-efficiency a-Si solar cellJournal of Applied Physics, 1982
- Some optical properties of polymer films prepared by glow discharge polymerization from methane, tetramethylsilane, and tetramethytinJournal of Polymer Science Part C: Polymer Letters, 1980
- Vibrational spectrum of hydrogenated amorphous Si-C filmsPhysica Status Solidi (b), 1979
- Electrical and optical properties of amorphous silicon carbide, silicon nitride and germanium carbide prepared by the glow discharge techniquePhilosophical Magazine, 1977