Negative-Resistance Current-Voltage Characteristics of an Indium Antimonide p+−p−n+ Diode
- 1 June 1968
- journal article
- research article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 39 (7) , 3244-3250
- https://doi.org/10.1063/1.1656763
Abstract
The negative resistance volt‐ampere characteristic of a solution‐grown indium antimonide p+−p−n+ diode is presented. The curve can be understood through the use of crude models. A prebreakdown nonlinearity and the negative resistance are attributed to the growth of a high‐conductivity plasma across the sample. A shallow negative resistance in the postbreakdown region is thought to be caused by lateral expansion of this plasma. Finally, a postbreakdown characteristic of the form I ∝ V3 is explained in terms of a double‐injection recombination‐limited current with a current‐dependent effective diode length.This publication has 12 references indexed in Scilit:
- Recombination Centers in InSbJournal of Applied Physics, 1967
- Solution Regrowth of Planar InSb Laser StructuresJournal of the Electrochemical Society, 1966
- Effects of Diffusion on Double Injection in InsulatorsPhysical Review B, 1965
- Double Injection in InsulatorsPhysical Review B, 1962
- Pinch Effect in Indium AntimonidePhysical Review B, 1961
- Carrier Lifetime in Indium AntimonidePhysical Review B, 1961
- Volume-Controlled, Two-Carrier Currents in Solids: The Injected Plasma CasePhysical Review B, 1961
- Recombination Processes in-Type Indium AntimonidePhysical Review B, 1959
- Measurement of Voltage-Current Characteristics of Junction Diodes at High Forward BiasJournal of Electronics and Control, 1958
- Analysis of Current Flow in a Planar Junction Diode at a High Forward BiasJournal of Electronics and Control, 1958