Thickness dependence of resistivity for Cu films deposited by ion beam deposition
- 1 July 2003
- journal article
- Published by Elsevier in Applied Surface Science
- Vol. 217 (1-4) , 95-99
- https://doi.org/10.1016/s0169-4332(03)00522-1
Abstract
No abstract availableThis publication has 8 references indexed in Scilit:
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