Influence of Substrate Bias Voltage on the Properties of Cu Thin Films by Sputter Type Ion Beam Deposition
Open Access
- 1 January 2002
- journal article
- Published by Japan Institute of Metals in MATERIALS TRANSACTIONS
- Vol. 43 (6) , 1403-1408
- https://doi.org/10.2320/matertrans.43.1403
Abstract
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