Optimization of the doping profile in Si permeable base transistors for high-frequency, high-frequency, high-voltage operation
- 1 January 1990
- journal article
- Published by Institute of Electrical and Electronics Engineers (IEEE) in IEEE Transactions on Electron Devices
- Vol. 37 (9) , 2090-2098
- https://doi.org/10.1109/16.57174
Abstract
No abstract availableThis publication has 9 references indexed in Scilit:
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