Hydrogen passivation of carbon-doped gallium arsenide
- 15 September 1993
- journal article
- research article
- Published by American Physical Society (APS) in Physical Review B
- Vol. 48 (12) , 8771-8779
- https://doi.org/10.1103/physrevb.48.8771
Abstract
The stability of a C atom at the cationic and anionic sites in GaAs and the hydrogen passivation of the C dopant activity have been investigated by performing first-principles total-energy calculations within the pseudopotential-density-functional-theory framework. In these calculations it is found that the C atom has almost the same stability at the gallium and at the arsenic sites. It is suggested that the preferred incorporation of C at the As site is due to phenomena occurring at the grown surface of GaAs. The H atom forms stable complexes with both the C acceptor () and the C donor (). The H- and H- complexes show the same structural features despite previous theoretical results. They are both characterized by a stable configuration where the H atom is located at the bond-centered site by a strong H-C interaction and by negligible interactions of H with the host atoms. Present results give theoretical evidence of the hydrogen passivation of C donors and acceptors. Moreover, they suggest that hydrogen may form strong bonds with carbon and passivate its dopant activity even in other III-V semiconductors.
Keywords
This publication has 23 references indexed in Scilit:
- The lattice sites of carbon and hydrogen incorporated in GaAs grown by MOVPE revealed by infrared spectroscopyJournal of Crystal Growth, 1992
- Raman spectroscopy of localized vibrational modes from carbon and carbon-hydrogen pairs in heavily carbon-doped GaAs epitaxial layersPhysical Review B, 1992
- Characterization of the GaAs: C and AlGaAs: C doping superlattice grown by chemical beam epitaxyJournal of Crystal Growth, 1991
- A comparison of atomic carbon versus beryllium acceptor doping in GaAs grown by molecular beam epitaxyJournal of Crystal Growth, 1991
- Carbon doping of MBE GaAs and Ga0.7Al0.3As films using a graphite filamentJournal of Crystal Growth, 1991
- p-type doping limit of carbon in organometallic vapor phase epitaxial growth of GaAs using carbon tetrachlorideApplied Physics Letters, 1990
- Electronic level of interstitial hydrogen in GaAsPhysical Review Letters, 1990
- Chemical beam epitaxial growth of strained carbon-doped GaAsApplied Physics Letters, 1990
- Characteristics of carbon incorporation in GaAs grown by gas source molecular beam epitaxyJournal of Crystal Growth, 1990
- Carbon incorporation in MOMBE-grown Ga0.47In0.53AsJournal of Crystal Growth, 1989