Structural study of initial layer for μc-Si:H growth using real time in situ spectroscopic ellipsometry and infrared spectroscopy
- 1 May 2000
- journal article
- Published by Elsevier in Journal of Non-Crystalline Solids
- Vol. 266-269, 38-42
- https://doi.org/10.1016/s0022-3093(99)00715-2
Abstract
No abstract availableKeywords
This publication has 12 references indexed in Scilit:
- Interface-layer formation mechanism inthin-film growth studied by real-time spectroscopic ellipsometry and infrared spectroscopyPhysical Review B, 1999
- Wide band gap amorphous silicon thin films prepared by chemical annealingJournal of Applied Physics, 1999
- Growth mechanism of microcrystalline silicon obtained from reactive plasmasThin Solid Films, 1999
- Optimization of hydrogenated amorphous silicon p–i–n solar cells with two-step i layers guided by real-time spectroscopic ellipsometryApplied Physics Letters, 1998
- Rotating-compensator multichannel ellipsometry: Applications for real time Stokes vector spectroscopy of thin film growthReview of Scientific Instruments, 1998
- Infrared absorption strength and hydrogen content of hydrogenated amorphous siliconPhysical Review B, 1992
- Control of silicon network structure in plasma depositionJournal of Non-Crystalline Solids, 1989
- Infrared spectroscopy of Si(111) and Si(100) surfaces after HF treatment: Hydrogen termination and surface morphologyJournal of Vacuum Science & Technology A, 1989
- Amorphous Silicon and Related MaterialsPublished by World Scientific Pub Co Pte Ltd ,1989
- Models for the Hydrogen-Related Defect—Impurity Complexes and Si-H Infrared Bands in Crystalline SiliconPhysica Status Solidi (a), 1982