Control of silicon network structure in plasma deposition
- 1 December 1989
- journal article
- Published by Elsevier in Journal of Non-Crystalline Solids
- Vol. 114, 151-153
- https://doi.org/10.1016/0022-3093(89)90096-3
Abstract
No abstract availableKeywords
This publication has 6 references indexed in Scilit:
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- Low-temperature crystallization of doped a-Si:H alloysApplied Physics Letters, 1980
- Electrical and Structural Properties of Phosphorous-Doped Glow-Discharge Si:F:H and Si:H FilmsJapanese Journal of Applied Physics, 1980
- Properties of heavily doped GDSi with low resistivityJournal of Non-Crystalline Solids, 1979