Elastic strain in thin epitaxial electrodeposits of gold and nickel on copper
- 1 January 1969
- journal article
- Published by Elsevier in Electrochimica Acta
- Vol. 14 (3) , 269-282
- https://doi.org/10.1016/0013-4686(69)85071-1
Abstract
No abstract availableKeywords
This publication has 31 references indexed in Scilit:
- X-Ray Determination of Residual Stresses in Electrodeposited CoatingsJournal of the Electrochemical Society, 1964
- Isotropic Stress Measurements in Permalloy FilmsJournal of Applied Physics, 1962
- Stress in Nickel ElectrodepositsTransactions of the IMF, 1959
- Stress Annealing in Vacuum Deposited Copper FilmsProceedings of the Physical Society. Section B, 1957
- The study of epitaxy in thin surface filmsAdvances in Physics, 1956
- The Influence of Internal Stress on the Structure of Electro-DepositsThe Journal of Chemical Physics, 1948
- Crystal growth at the cathodeDiscussions of the Faraday Society, 1947
- The structure of some metallic deposits on a copper single crystal as determined by electron-diffractionProceedings of the Physical Society, 1936
- The Orientations of Crystals in Electrodeposited MetalsPhysical Review B, 1925
- I. On electrostrictionProceedings of the Royal Society of London, 1878