The application of hard coatings produced by plasma-assisted chemical vapour deposition
- 1 December 1990
- journal article
- Published by Elsevier in Surface and Coatings Technology
- Vol. 43-44, 1007-1014
- https://doi.org/10.1016/0257-8972(90)90039-f
Abstract
No abstract availableKeywords
This publication has 7 references indexed in Scilit:
- Plasma-assisted chemical vapour deposition of TiN and TiC on steel: Properties of coatingsThin Solid Films, 1988
- Influence of temperature on the growth of TiN films by plasma-assisted chemical vapour depositionThin Solid Films, 1988
- Studies of interfacial composition of TiN films formed by plasma‐assisted chemical vapor deposition using an in situ scratching deviceJournal of Vacuum Science & Technology A, 1986
- Composition, morphology and mechanical properties of plasma-assisted chemically vapor-deposited TiN films on M2 tool steelThin Solid Films, 1986
- Neue Entwicklungen zur Herstellung von Hartstoffschichten mittles Plasma‐CVDMaterialwissenschaft und Werkstofftechnik, 1986
- Titanium Nitride PVD Coating TechnologySurface Engineering, 1985
- Plasma chemical vapor deposition of TiNPlasma Chemistry and Plasma Processing, 1984