Quantitative depth profiling with AES: application to oxide layers of NiCrFe alloys
- 1 January 1989
- journal article
- Published by Springer Nature in Analytical and Bioanalytical Chemistry
- Vol. 333 (4) , 408-409
- https://doi.org/10.1007/bf00572338
Abstract
No abstract availableKeywords
This publication has 6 references indexed in Scilit:
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- Quantitative AES depth profiling of very thin overlayersSurface and Interface Analysis, 1986
- Practical surface analysis: state of the art and recent developments in AES, XPS, ISS and SIMSSurface and Interface Analysis, 1986
- Quantification of preferential sputtering and contamination overlayer effects in AES sputter profilingSurface and Interface Analysis, 1984
- The statistical sputtering contribution to resolution in concentration-depth profilesThin Solid Films, 1981