Influence of low-temperature interlayers on strain and defect density of epitaxial GaN layers
- 19 December 2002
- journal article
- Published by Elsevier in Journal of Crystal Growth
- Vol. 248, 528-532
- https://doi.org/10.1016/s0022-0248(02)01883-3
Abstract
No abstract availableKeywords
This publication has 8 references indexed in Scilit:
- Thick, crack-free blue light-emitting diodes on Si(111) using low-temperature AlN interlayers and in situ SixNy maskingApplied Physics Letters, 2002
- High-Efficiency GaN/AlxGa1?xN Multi-Quantum-Well Light Emitter Grown on Low-Dislocation Density AlxGa1?xNPhysica Status Solidi (a), 2001
- Reduction of threading dislocation density in GaN using an intermediate temperature interlayerApplied Physics Letters, 2000
- Dislocation reduction in GaN films through selective island growth of InGaNApplied Physics Letters, 2000
- Residual strain dependence of optical characteristics in GaN layers grown on (0001) sapphire substratesApplied Physics Letters, 1999
- A new buffer layer for high quality GaN growth by metalorganic vapor phase epitaxyApplied Physics Letters, 1998
- Pit formation in GaInN quantum wellsApplied Physics Letters, 1998
- Formation Mechanism of Nanotubes in GaNPhysical Review Letters, 1997