Annealing behavior of hydrogenated amorphous silicon—nitrogen alloy films prepared by sputtering
- 1 October 1983
- journal article
- research article
- Published by Wiley in Physica Status Solidi (b)
- Vol. 119 (2) , 715-720
- https://doi.org/10.1002/pssb.2221190233
Abstract
No abstract availableKeywords
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