Applications of negative-ion beams
- 1 January 1994
- journal article
- Published by Elsevier in Surface and Coatings Technology
- Vol. 65 (1-3) , 64-70
- https://doi.org/10.1016/s0257-8972(94)80010-3
Abstract
No abstract availableThis publication has 12 references indexed in Scilit:
- Radio frequency plasma sputter type heavy negative ion sourceVacuum, 1993
- Carbon negative ion implantation into siliconNuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 1993
- Negative ion beam technology for materials science (invited)Review of Scientific Instruments, 1992
- High-intensity plasma-sputter heavy negative-ion source (invited)Review of Scientific Instruments, 1990
- Electron detachment cross-sections for heavy negative-ion beamNuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 1989
- A heavy negative ion sputter source: Production mechanism of negative ions and their applicationsNuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 1989
- Surface structure estimation by plasma fluorination of amorphous carbon, diamond, graphite and plastic film surfacesJournal of Physics D: Applied Physics, 1986
- Mass-separated negative-ion-beam deposition systemReview of Scientific Instruments, 1986
- Neutral and ionized alkaline metal bombardment type heavy negative-ion source (NIABNIS)Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 1984
- A close to universal negative ion sourceNuclear Instruments and Methods, 1974