Negative-tone high-resolution photocatalytic resist for x-ray lithography
- 31 May 1989
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 9 (1-4) , 575-578
- https://doi.org/10.1016/0167-9317(89)90123-8
Abstract
No abstract availableKeywords
This publication has 6 references indexed in Scilit:
- Characterization of a high-resolution novolak based negative electron-beam resist with 4 μC/cm2 sensitivityJournal of Vacuum Science & Technology B, 1988
- A study of catalytically transformed negative X-ray resists, based on aqueous base developable resin, an acid generator and a crosslinkerMicroelectronic Engineering, 1987
- Photocatalytic novolak-based positive resist for X-ray lithography - kinetics and simulation -Microelectronic Engineering, 1987
- A Practical Approach To Submicron LithographyPublished by SPIE-Intl Soc Optical Eng ,1987
- Highly-sensitive novolak-based positive X-ray resistMicroelectronic Engineering, 1986
- Possibilities for photoimaging using onium saltsPolymer Engineering & Science, 1983