Plasma-assisted etching of tungsten films: A quartz-crystal microbalance study
- 1 March 1988
- journal article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 63 (5) , 1758-1761
- https://doi.org/10.1063/1.339915
Abstract
The plasma-assisted etching of magnetron-sputtered polycrystalline tungsten films in CF4-H2 and CF4-O2 glow discharges has been studied as a function of ion energy using quartz-crystal microbalance methods supplemented by vacuum-transfer Auger electron spectroscopy and actinometric emission spectroscopy.This publication has 17 references indexed in Scilit:
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