Photoemission from GaN
- 1 July 1974
- journal article
- research article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 25 (1) , 53-55
- https://doi.org/10.1063/1.1655276
Abstract
Photoemissive yield measurements were performed on degenerate n‐type and semi‐insulating GaN for heat‐cleaned and for cesiated surfaces. The photoemissive threshold for heat‐cleaned n‐type material occurs at 4.1 eV, while that for semi‐insulating material is beyond 5.5 eV, the experimental spectral range. From these measurements an upper and a lower limit of the electron affinity of heat‐cleaned GaN is derived, namely 4.1 > χ > 2.1 eV. The threshold for cesiated surfaces on both materials is lowered to 1.5 eV, and the photoyield curve exhibits a second threshold at about 3.4 eV. The occurrence of negative electron affinity is suggested for cesiated semi‐insulating GaN.Keywords
This publication has 6 references indexed in Scilit:
- Current status of negative electron affinity devicesProceedings of the IEEE, 1971
- Band structures of GaN and AINJournal of Physics and Chemistry of Solids, 1971
- THE PREPARATION AND PROPERTIES OF VAPOR-DEPOSITED SINGLE-CRYSTAL-LINE GaNApplied Physics Letters, 1969
- Spectral Analysis of Photoemissive Yields in Si, Ge, GaAs, GaSb, InAs, and InSbPhysical Review B, 1965
- The analysis of spectral yield and accelerating field characteristics of the photoelectric emission from semiconductorsJournal of Physics and Chemistry of Solids, 1960
- Über die Kantenemission und andere Emissionen des GaNZeitschrift für Naturforschung A, 1959