The crystalline to amorphous transformation in silicon
- 1 May 1983
- journal article
- Published by Elsevier in Nuclear Instruments and Methods in Physics Research
- Vol. 209-210, 345-350
- https://doi.org/10.1016/0167-5087(83)90821-9
Abstract
No abstract availableKeywords
This publication has 8 references indexed in Scilit:
- A neutron diffraction study of the structure of evaporated amorphous germaniumJournal of Non-Crystalline Solids, 1982
- Some observations on the amorphous to crystalline transformation in siliconJournal of Applied Physics, 1982
- Displacement criterion for amorphization of silicon during ion implantationJournal of Applied Physics, 1981
- A new technique for observing the amorphous to crystalline transformation in thin surface layers on silicon wafersJournal of Applied Physics, 1980
- Regrowth behavior of ion-implanted amorphous layers on 〈111〉 siliconApplied Physics Letters, 1976
- Numerical evaluations ofN-beam wave functions in electron scattering by the multi-slice methodActa Crystallographica Section A, 1974
- Tetrahedrally Coordinated Random-Network StructurePhysical Review Letters, 1973
- A model for the formation of amorphous Si by ion bombardmentRadiation Effects, 1970