Pressure dependence of the resputtering of Y-Ba-Cu-O thin films grown by DC magnetron sputtering
- 1 January 1991
- journal article
- Published by IOP Publishing in Superconductor Science and Technology
- Vol. 4 (1S) , S379-S381
- https://doi.org/10.1088/0953-2048/4/1s/112
Abstract
YBa2Cu3O6+x films were grown using DC magnetron sputtering from fully presputtered stoichiometric compound targets. A planar geometry was used with the substrates opposing the target. For deposition at high substrate temperatures the film composition was strongly pressure dependent. Films were stoichiometric when grown at pressures above 9.0 Pa, and at 600 degrees C. At lower pressures resputtering by energetic oxygen occurred. The generation of these energetic particles is discussed and a method to avoid deterious bombardment is presented.Keywords
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