Preparation of fluorinated amorphous carbon thin films
- 1 May 1998
- journal article
- Published by Elsevier in Journal of Non-Crystalline Solids
- Vol. 227-230, 641-644
- https://doi.org/10.1016/s0022-3093(98)00234-8
Abstract
No abstract availableThis publication has 9 references indexed in Scilit:
- Design guidelines for deep-sub-micrometer interconnectionsPublished by Institute of Electrical and Electronics Engineers (IEEE) ,2002
- Fluorinated amorphous carbon thin films grown by helicon plasma enhanced chemical vapor deposition for low dielectric constant interlayer dielectricsApplied Physics Letters, 1996
- Fluorinated amorphous carbon thin films grown by plasma enhanced chemical vapor deposition for low dielectric constant interlayer dielectricsJournal of Applied Physics, 1995
- Low Dielectric Constant Interlayer Using Fluorine-Doped Silicon OxideJapanese Journal of Applied Physics, 1994
- A Room Temperature Chemical Vapor Deposition SiOF Film Formation Technology for the Interlayer in Submicron Multilevel InterconnectionsJournal of the Electrochemical Society, 1993
- Characterization of diamondlike carbon by infrared spectroscopy?Applied Physics Letters, 1992
- Deposition of amorphous fluoropolymer thin films by thermolysis of Teflon amorphous fluoropolymerApplied Physics Letters, 1992
- Relationships between the plasma environment and the composition and optical properties of plasma-polymerized thin films produced in rf discharges of C2H2-SF6 mixturesJournal of Applied Physics, 1992
- Bonding in hydrogenated hard carbon studied by optical spectroscopySolid State Communications, 1983