A New Anode-Electrode Structure for Sputter Deposition of High-Quality Y-Ba-Cu-O Thin Films

Abstract
A new structure of the anode electrode is presented for sputter deposition of Y-Ba-Cu-O thin films. The present anode electrode is expected to reduce the damage due to charged particles incident on the film surface. Using this method, high-quality films with very smooth surfaces and critical current density as large as j C(4.2 K)=2.1×107 A/cm2 can be obtained reproducibly.