Comparison of the diffusion barrier properties of tungsten films prepared by hydrogen and silicon reduction of tungsten hexafluoride
- 1 April 1989
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 171 (2) , 343-357
- https://doi.org/10.1016/0040-6090(89)90641-x
Abstract
No abstract availableKeywords
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