Effects of N2 plasma treatment of titanium nitride/borophosphosilicate glass patterned substrates on metal organic chemical vapor deposition of copper
- 1 July 1999
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 349 (1-2) , 36-42
- https://doi.org/10.1016/s0040-6090(99)00162-5
Abstract
No abstract availableKeywords
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