Application of turbulence modeling to the integrated hydrodynamic thermal-capillary model of Czochralski crystal growth of silicon
- 1 September 1993
- journal article
- Published by Elsevier in Journal of Crystal Growth
- Vol. 132 (3-4) , 551-574
- https://doi.org/10.1016/0022-0248(93)90083-9
Abstract
No abstract availableKeywords
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