The design and performance of planar magnetron sputtering cathodes
- 1 January 1987
- Vol. 37 (3-4) , 363-366
- https://doi.org/10.1016/0042-207x(87)90026-1
Abstract
No abstract availableKeywords
This publication has 4 references indexed in Scilit:
- The impact of process parameters and coating source on the properties of magnetic recording layersJournal of Vacuum Science & Technology A, 1986
- Planar magnetron sputtering cathode with deposition rate distribution controllabilityThin Solid Films, 1982
- Planar magnetron sputteringJournal of Vacuum Science and Technology, 1978
- Magnetron sputtering: basic physics and application to cylindrical magnetronsJournal of Vacuum Science and Technology, 1978