Formation of aluminum films on silicon by ion beam deposition: a comparison with ionized cluster beam deposition
Open Access
- 1 July 1991
- journal article
- Published by Elsevier in Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
- Vol. 59-60, 308-311
- https://doi.org/10.1016/0168-583x(91)95229-7
Abstract
No abstract availableKeywords
This publication has 8 references indexed in Scilit:
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