The effect of ion species on morphological structure development of ion bombarded (1131) single crystal Cu
- 1 January 1984
- Vol. 34 (1-2) , 167-173
- https://doi.org/10.1016/0042-207x(84)90122-2
Abstract
No abstract availableKeywords
This publication has 4 references indexed in Scilit:
- Ion bombardment induced surface topography modification of clean and contaminated single crystal Cu and SiSurface and Interface Analysis, 1982
- The effect of incidence angle on ion bombardment induced surface topography development on single crystal copperNuclear Instruments and Methods in Physics Research, 1982
- The mechanisms of etch pit and ripple structure formation on ion bombarded Si and other amorphous solidsNuclear Instruments and Methods, 1980
- The production of regular pyramids on argon ion bombarded surfaces of copper crystalsApplications of Surface Science, 1978