The deposition of alumina, silica and magnesia films by electron bombardment evaporation
- 1 September 1964
- journal article
- Published by Elsevier in Microelectronics Reliability
- Vol. 3 (2) , 109-120
- https://doi.org/10.1016/0026-2714(64)90245-8
Abstract
No abstract availableThis publication has 5 references indexed in Scilit:
- Logical pattern synthesisPublished by Institute of Electrical and Electronics Engineers (IEEE) ,2005
- Electrical Properties of Evaporated Aluminum Oxide FilmsJournal of the Electrochemical Society, 1962
- Thin-film capacitors using tantalum oxide dielectrics prepared by reactive sputteringSolid-State Electronics, 1961
- Vacuum deposition of dielectric films for capacitorsVacuum, 1959
- Formation of Thin Films of BaTiO3 by EvaporationReview of Scientific Instruments, 1955