Lithography
- 1 January 1981
- journal article
- Published by Elsevier in Radiation Physics and Chemistry (1977)
- Vol. 18 (1-2) , 357-369
- https://doi.org/10.1016/0146-5724(81)90087-x
Abstract
No abstract availableThis publication has 8 references indexed in Scilit:
- High-resolution, ion-beam processes for microstructure fabricationJournal of Vacuum Science and Technology, 1979
- High-resolution systems for microfabricationPhysics Today, 1979
- Developments in electron image projectionJournal of Vacuum Science and Technology, 1979
- Abstract: Etching in reactive plasmasJournal of Vacuum Science and Technology, 1979
- Double-aperture method of producing variably shaped writing spots for electron lithographyJournal of Vacuum Science and Technology, 1978
- Variable spot shaping for electron-beam lithographyJournal of Vacuum Science and Technology, 1978
- Electron-projection microfabrication systemJournal of Vacuum Science and Technology, 1975
- EBES: A practical electron lithographic systemIEEE Transactions on Electron Devices, 1975