Phosphorus-related donors in 6H-SiC generated by ion implantation

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Abstract
Aluminum‐doped 6H‐SiC epilayers were implanted with phosphorus and subsequently annealed in a temperature range from 1400 to 1700 °C. The annealing behavior of implanted phosphorus atoms was studied by the Hall effect, admittance spectroscopy, and photoluminescence. Phosphorus acts as a shallow donor. Two ionization energies of (80±5) meV and (110±5) meV are determined, which are assigned to phosphorus atoms residing at hexagonal and cubic lattice sites, respectively. Assuming first‐order kinetics, the annealing process results in an activation energy of the phosphorus donors of 2.5 eV. A set of four lines at a wavelength of about 420/421 nm is observed in the low temperature photoluminescence spectra; the intensity of these lines increases in parallel with the electrical activation of phosphorus donors by raising the annealing temperature. It is proposed that these lines are phosphorus‐related.