Mie-Scattering Ellipsometry for Analysis of Particle Behaviors in Processing Plasmas
- 1 March 1994
- journal article
- Published by IOP Publishing in Japanese Journal of Applied Physics
- Vol. 33 (3B) , L476-478
- https://doi.org/10.1143/jjap.33.l476
Abstract
In-process Mie-scattering ellipsometry has been newly developed. The refractive index of the particles and the spread of particle size distribution, as well as the mean particle size and the density, can be evaluated by the method. As a demonstration, the behavior of carbon particles injected into argon plasma was observed. It was suggested from the analyzed results that the size of carbon particles increased through coagulation in argon plasma, the geometric standard deviation of the size distribution was about 1.5, and the coagulated particles have smaller refractive index than evaporated carbon.Keywords
This publication has 8 references indexed in Scilit:
- Negative hydrogenated silicon ion clusters as particle precursors in RF silane plasma deposition experimentsJournal of Physics D: Applied Physics, 1993
- Observation of growing kinetics of particles in a helium-diluted silane rf plasmaApplied Physics Letters, 1992
- Measurements of particle size kinetics from nanometer to micrometer scale in a low-pressure argon-silane radio-frequency dischargeApplied Physics Letters, 1992
- Particle generation and behavior in a silane-argon low-pressure discharge under continuous or pulsed radio-frequency excitationJournal of Applied Physics, 1991
- Particle trapping phenomena in radio frequency plasmasApplied Physics Letters, 1990
- CHANGE IN PARTICLE SIZE DISTRIBUTIONS OF POLYDISPERSE AEROSOLS UNDERGOING BROWNIAN COAGULATIONJOURNAL OF CHEMICAL ENGINEERING OF JAPAN, 1975
- Design and Operation of ETA, an Automated EllipsometerIBM Journal of Research and Development, 1973
- Transition Radiation and Optical Properties of Evaporated Carbon Foil*,†Journal of the Optical Society of America, 1971