Thin film deposition profiles using a ballistic aggregation model
- 1 April 1989
- journal article
- Published by Springer Nature in Journal of Materials Science Letters
- Vol. 8 (4) , 415-417
- https://doi.org/10.1007/bf00720691
Abstract
No abstract availableKeywords
This publication has 13 references indexed in Scilit:
- The effect of gas scattering on the deposition profile of optical thin filmsJournal of Vacuum Science & Technology A, 1987
- A new metallization technique for very large scale integrated structures: Experiments and computer simulationJournal of Vacuum Science & Technology B, 1986
- Computer Simulation Of Thin Film Growth: Applying The Results To Optical CoatingsOptical Engineering, 1986
- Fractal scaling in thin film condensation and material surfacesCritical Reviews in Solid State and Materials Sciences, 1986
- Planarization by radio-frequency bias sputtering of aluminum as studied experimentally and by computer simulationJournal of Vacuum Science & Technology A, 1985
- Application of line-edge profile simulation to thin-film deposition processesIEEE Transactions on Electron Devices, 1980
- High Rate Thick Film GrowthAnnual Review of Materials Science, 1977
- Simulation of structural anisotropy and void formation in amorphous thin filmsApplied Physics Letters, 1974
- Step coverage from an extended sputtering sourceThin Solid Films, 1974
- Evaporated film profiles over steps in substratesThin Solid Films, 1970