Epitaktische Abscheidung von GaAs im System Ga(CH3)3-AsH3-H2 (I) Autoepitaktische Abscheidung
- 1 January 1974
- journal article
- research article
- Published by Wiley in Crystal Research and Technology
- Vol. 9 (3) , 209-217
- https://doi.org/10.1002/crat.19740090304
Abstract
No abstract availableKeywords
This publication has 18 references indexed in Scilit:
- Röntgenographische Untersuchungen zur Kristallperfektion von GaAs‐Einkristallen und ‐Epitaxieschichten. Will Kleber zum GedenkenCrystal Research and Technology, 1972
- Heteroepitaxial GaAs on aluminum oxide. I: Early growth studiesMetallurgical Transactions, 1970
- The Use of Metal-Organics in the Preparation of Semiconductor MaterialsJournal of the Electrochemical Society, 1969
- Dislocation Etch Pits in Single Crystal GaAsPhysica Status Solidi (b), 1969
- Arseniure de gallium de haute mobilite obtenu par epitaxie en phase liquideMaterials Research Bulletin, 1968
- Oriented Growth of Semiconductors. V. Surface Features and Twins in Epitaxial Gallium ArsenideJournal of Applied Physics, 1967
- Preparation of high purity epitaxial gallium arsenide from the elementsSolid-State Electronics, 1967
- Electrical Properties of n‐Type Epitaxial Gallium ArsenidePhysica Status Solidi (b), 1966
- Polarity effects in III–V semiconducting compoundsJournal of Physics and Chemistry of Solids, 1965
- Oriented growth of semiconductors I. Orientations in gallium arsenide grown epitaxially on germaniumPhilosophical Magazine, 1965