Oxidation of Si beneath thin SiO2 layers during exposure to HBr/O2 plasmas, investigated by vacuum transfer x-ray photoelectron spectroscopy
- 1 March 1999
- journal article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 74 (9) , 1260-1262
- https://doi.org/10.1063/1.123518
Abstract
No abstract availableKeywords
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