Characterization of aluminium films deposited by ion-beam-assisted ultrahigh vacuum evaporation
- 1 December 1990
- journal article
- Published by Elsevier in Surface and Coatings Technology
- Vol. 43-44, 963-974
- https://doi.org/10.1016/0257-8972(90)90035-b
Abstract
No abstract availableThis publication has 15 references indexed in Scilit:
- JUSIFA—A new user-dedicated ASAXS beamline for materials scienceReview of Scientific Instruments, 1989
- A comparison of the step coverage of aluminum coatings produced by two sputter magnetron systems and a dual-beam ion systemThin Solid Films, 1988
- Ion beam suppression of hillock growth in aluminium thin filmsThin Solid Films, 1988
- Ion-Beam-Assisted Deposition and SynthesisMRS Bulletin, 1987
- Property modification and synthesis by low energy particle bombardment concurrent with film growthNuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 1987
- Optical and electrical properties of thin silver films grown under ion bombardmentPhysical Review B, 1986
- Technology and applications of broad-beam ion sources used in sputtering. Part II. ApplicationsJournal of Vacuum Science and Technology, 1982
- Ion-beam-induced texture formation in vacuum-condensed thin metal filmsThin Solid Films, 1982
- The effect of ion irradiation on the adherence of germanium filmsThin Solid Films, 1978
- Resistivity and Structure of Evaporated Aluminum FilmsJournal of Vacuum Science and Technology, 1969