Fabrication of free-standing quantum wells
- 14 September 1992
- journal article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 61 (11) , 1353-1354
- https://doi.org/10.1063/1.107589
Abstract
Standard lithographic techniques have been utilized to fabricate quantum wells which are confined on both sides by vacuum. These ‘‘naked’’ quantum wells are fabricated from spatially and compositionally modulated III-V superlattices in which alternate layers of the structures are sacrificed by selective etching. These structures are patterned such that the quantum wells are suspended between support posts.Keywords
This publication has 9 references indexed in Scilit:
- Spontaneous emission from a dipole in a semiconductor microcavityJournal of Applied Physics, 1991
- High index contrast mirrors for optical microcavitiesApplied Physics Letters, 1990
- Near-surface GaAs/As quantum wells: Interaction with the surface statesPhysical Review B, 1990
- Rate equation analysis of microcavity lasersJournal of Applied Physics, 1989
- Experimental probing of quantum-well eigenstatesPhysical Review Letters, 1989
- Microporous GaAs/GaAlAs superlatticesJournal of Vacuum Science & Technology B, 1988
- Anomalous Spontaneous Emission Time in a Microscopic Optical CavityPhysical Review Letters, 1987
- Surface quantum wellsApplied Physics Letters, 1987
- Inhibited Spontaneous Emission in Solid-State Physics and ElectronicsPhysical Review Letters, 1987