In Situ Monitoring of Optical Reflectance Oscillation in Layer-by-Layer Chemical Vapor Deposition of Oxide Superconductor Films

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Abstract
We have applied in situ optical diagnostics for the first time in layer-by-layer chemical vapor deposition (CVD) of oxide superconductor films. A cw diode laser of 780 nm emission is used for the light source of the optical experimental system. We have observed the variation of the optical reflection from the growing surface during the layer-by-layer CVD of YBaCuO and related oxides. This method can be used as a diagnostic tool to monitor (i) the crystal growth with an atomic-scale accuracy similar to RHEED oscillation and (ii) the surface reactions of the decomposition of precursors, the oxidization of metals, and so forth.