Characterization of tantalum impurities in hot-filament diamond layers
- 30 April 1994
- journal article
- Published by Elsevier in Diamond and Related Materials
- Vol. 3 (4-6) , 638-644
- https://doi.org/10.1016/0925-9635(94)90240-2
Abstract
No abstract availableKeywords
This publication has 16 references indexed in Scilit:
- Diamond growth by hot-filament chemical vapor deposition: state of the artDiamond and Related Materials, 1993
- Diamond chemical vapour deposition using tantalum filaments in H2CH4O2 gas mixturesDiamond and Related Materials, 1993
- Influence of hot filament-d.c. plasma co-enhancement on low pressure diamond synthesisDiamond and Related Materials, 1992
- Hot-filament-grown diamond films on Si: characterization of impuritiesDiamond and Related Materials, 1992
- Tungsten incorporation in diamond thin films prepared by the hotfilament techniqueDiamond and Related Materials, 1992
- Carburization of tungsten and tantalum filaments during low-pressure diamond depositionSurface and Coatings Technology, 1991
- Diamond deposition on cemented carbide by chemical vapour deposition using a tantalum filamentJournal of Materials Science, 1990
- The deposition of diamond films by filament techniquesJournal of Vacuum Science & Technology A, 1990
- Effect of oxygen addition on microwave plasma CVD of diamond from CH4-H2 mixtureMaterials Research Bulletin, 1989
- Growth of diamond particles from methane-hydrogen gasJournal of Materials Science, 1982