Degradation behavior in the remnant polarization of SrBi2Ta2O9 thin films by hydrogen annealing and its recovery by postannealing
- 26 July 1999
- journal article
- research article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 75 (4) , 558-560
- https://doi.org/10.1063/1.124421
Abstract
The degradation behavior in the remnant polarization (Pr) of sol–gel-derived SrBi2Ta2O9 (SBT) thin films, with Pt top and bottom electrodes, by annealing under a 5% H2/95% N2 atmosphere is investigated. The hydrogen annealing is performed at temperatures ranging from 250 to 480 °C. By annealing, the Pr drops to almost zero for all temperatures. Postannealing at temperatures higher than 700 °C under an air atmosphere recovers the Pr. Interestingly, the recovery is most ineffective for the sample annealed at the Curie temperature of the SBT films. A phenomenological model that explains this anomalous recovery behavior is presented.Keywords
This publication has 7 references indexed in Scilit:
- Analytical transmission electron microscopy of hydrogen-induced degradation in ferroelectric Pb(Zr, Ti)O3 on a Pt electrodeApplied Physics Letters, 1998
- Effect of hydrogen on Pb(Zr,Ti)O3-based ferroelectric capacitorsApplied Physics Letters, 1998
- Dielectric anomaly in strontium bismuth tantalate thin filmsApplied Physics Letters, 1998
- Electrode dependence of hydrogen-induced degradation in ferroelectric Pb(Zr,Ti)O3 and SrBi2Ta2O9 thin filmsApplied Physics Letters, 1997
- H 2 damage of ferroelectric Pb(Zr,Ti)O3 thin-film capacitors—The role of catalytic and adsorptive activity of the top electrodeApplied Physics Letters, 1997
- Relationships among ferroelectric fatigue, electronic charge trapping, defect-dipoles, and oxygen vacancies in perovskite oxidesIntegrated Ferroelectrics, 1997
- Electrode-induced degradation of Pb(ZrxTi1−x)O3 (PZT) polarization hysteresis characteristics in Pt/PZT/Pt ferroelectric thin-film capacitorsApplied Physics Letters, 1996