Gap state distribution of hydrogenated amorphous silicon-germanium alloys
- 1 July 1984
- journal article
- Published by Elsevier in Journal of Non-Crystalline Solids
- Vol. 66 (1-2) , 187-192
- https://doi.org/10.1016/0022-3093(84)90319-3
Abstract
No abstract availableKeywords
This publication has 5 references indexed in Scilit:
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- Gap state distribution of amorphous hydrogenated Si and Si:Ge alloysJournal of Non-Crystalline Solids, 1983
- Study of gap states in hydrogenated amorphous silicon by transient and steady-state photoconductivity measurementsPhysical Review B, 1983
- ESR and IR Studies on a-Si1-xGex:H Prepared by Glow Discharge DecompositionJapanese Journal of Applied Physics, 1981
- The interpretation of transport results in amorphous siliconJournal of Non-Crystalline Solids, 1980