Plasma deposited microcrystalline and amorphous silicon — a comparative study of photoluminescence
- 31 March 1983
- journal article
- Published by Elsevier in Physica B+C
- Vol. 117-118, 917-919
- https://doi.org/10.1016/0378-4363(83)90693-9
Abstract
No abstract availableKeywords
This publication has 6 references indexed in Scilit:
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- A Photoluminescence Study of Amorphous-Microcrystalline Mixed-Phase Si:H FilmsJapanese Journal of Applied Physics, 1981
- Luminescence and recombination in hydrogenated amorphous siliconAdvances in Physics, 1981
- Photoconductivité due à l'autoionisation de Ce2+ dans CaF 2, SrF2 et BaF2Journal de Physique, 1981
- Photoluminescence in sputtered amorphous Si:H alloysJournal of Non-Crystalline Solids, 1980
- The effect of gap state density on the photoconductivity and photoluminescence of a-Si:HSolid State Communications, 1979