Growth kinetics of refractory-metal thin films sputtered by r.f.-d.c. coupled magnetron sputtering in Ar or Ne gas plasma
- 1 August 1995
- Vol. 46 (8-10) , 1059-1062
- https://doi.org/10.1016/0042-207x(95)00106-9
Abstract
No abstract availableThis publication has 12 references indexed in Scilit:
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