Masked deposition techniques for achieving multilayer period variations required for short-wavelength (68-Å) soft-x-ray imaging optics
- 1 December 1993
- journal article
- research article
- Published by Optica Publishing Group in Applied Optics
- Vol. 32 (34) , 6961-6968
- https://doi.org/10.1364/ao.32.006961
Abstract
Optics InfoBase is the Optical Society's online library for flagship journals, partnered and copublished journals, and recent proceedings from OSA conferences.Keywords
This publication has 5 references indexed in Scilit:
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- A soft x-ray/EUV reflectometer based on a laser produced plasma sourceJournal of X-Ray Science and Technology, 1992
- Normal-incidence x-ray mirror for 7 nmOptics Letters, 1991
- Multilayer reflecting x-ray optical systems: chromatic vignetting by narrow reflection bandsApplied Optics, 1991